Our Products

Atomic Layer Processing
Atomry
Research-scale versatile thermal Atomic Layer Deposition (ALD) tool designed for university laboratories and industrial research groups...
Layerava
Ground-breaking research-scale PEALD tool for university laboratories and industrial research groups..
Glovebox ALD
Glovebox integrated Atomic Layer Deposition (ALD) for air and moisture sensitive substrates used in energy storage, catalysis and organic semiconductor research...
Gradian
Lab-scale powder Atomic Layer Deposition (ALD) tool for conformal 3D coating of powder substrates...

ABOUT USMission and Vision:

Born from a passion for research in the area of Atomic Layer Deposition (ALD), OkyayTech is building custom ALD tools for university researchers and industrial research groups. Our philosophy is to design tools that can make ALD technology accessible for all researchers. Therefore, in our tool design we emphasize reducing complexity and promoting easy use for our customers while providing best-in-class performance and customization driven by research needs. Patented plasma technology is the state-of-the-art for the lowest Oxygen contamination in ALD-grown Nitride films.

Atomic Layer Deposition has been around almost 50 years. ALD  is a modified CVD technique where the reaction is split into two parts. Each ‘half-reaction’ is self-limiting and surface-only. After completion of the two half-reactions, a monolayer of film has been deposited on the surface.

Scientific Background:

OkyayTech was founded by scientists with more than 40 years of combined nanotechnology and ALD expertise. Over 300 published academic papers in the area of Atomic Layer Deposition.

CONTACT USContact Us

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